Aluminum nitride product / ALN heater substrate

Aluminum nitride product / ALN heater substrate

Product ALN heater substrate
Material Aluminum nitride
Processing Method Grooving (Groove width: 0.3mm)
Size Φ200 x 5 mm(T)
Application Components of vacuum devices for semiconductor-manufacturing equipments
Description Aluminum nitride has properties of  high heat resistant, high heat conductivity, excellent heat equalization and electrical insulation. ALN heater substrate is used for mainly semiconductor manufacturing devices, and also it can be used for vacuum evaporation system, sputtering machines and CVD devices.

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