Aluminum nitride product / ALN heater substrate
|Product||ALN heater substrate|
|Processing Method||Grooving (Groove width: 0.3mm)|
Φ200 x 5 mm(T)
Components of vacuum devices for semiconductor-manufacturing equipments
Aluminum nitride has properties of high heat resistant, high heat conductivity, excellent heat equalization and electrical insulation. ALN heater substrate is used for mainly semiconductor manufacturing devices, and also it can be used for vacuum evaporation system, sputtering machines and CVD devices.